JEOL - Wafer and Mask Inspection

Wafer and Mask Inspection

JEOL provides solutions in this area for the following problems and tasks:

Wafer and mask inspection (defect review)

The systems can be configured for interactive work (engineering tool) as well as for fully automated inspection (ADR, ADC). All systems provide brilliant image quality and the best resolution in a low voltage range (1 kV). Easy operation and maximum throughput speeds are standard.

 

Models

For additional product information, please select a model from the following list.

  • JEOL JWS Series

    JEOL JWS Series

    Wafer inspection for substrate sizes up to 200 mm (e.g. switching between 6" and 8" is also possible), wafer tilting up to 60°, resolution < 5nm at 1 kV

  • JEOL WM Series

    JEOL WM Series

    Instruments for verification of surface defects on wafers with a sensitivity up to 48 nm (for bare wafers) using a violet laser diode with a wavelength of 408 nm, which allows you to differentiate between particles defects. JEOL wafer surface analyzers offer the best possible performance at low investment and maintenance costs.

 

Subject to technical changes; errors excepted. All brand names that appear in the text are registered trademarks of the manufacturers.

 

Exhibition Dates

  • Scandem

    12.06. - 15.06.2012 in Bergen, Norway

    63rd annual meeting of SCANDEM, the Nordic microscopy society

  • Euromar 2012

    01.07. - 05.07.2012 in Dublin, Ireland

    Annual international conference on Magnetic Resonance

  • Ultrapath XVI

    06.08. - 10.08.2012 in Regensburg, Germany

    Conference on Diagnostic Microscopy Basic Research & Oncology, located at the University Medical Center in Regensburg, Germany

All dates