JEOL has served the semiconductor industry for more than 40 years with both e-beam and ion beam optics designed for precise patterning and inspection. Our latest generation of tools offers advanced capabilities that will take you through several next-generation designs – through the 22nm node.
JEOL produces both front-end and back-end tools for advanced semiconductor research and manufacturing. From e-beam lithography systems and FE-SEMs used to write high precision masks, reticles, and wafers…to FIB/SEM solutions for high throughput, cross-section imaging…to defect review tools designed for rapid analysis…JEOL semiconductor equipment meets the increasingly sophisticated needs of fabs and research laboratories. JEOL offers leading-edge solutions for 200/300mm, nano-fabrication processes, and nanoscience research -- backed by award-winning 24/7 service support and long-term commitment to our customers.
Electron Beam Lithography Systems
Wafer and Mask Inspection Systems
CD Measurement Systems for Masks
63rd annual meeting of SCANDEM, the Nordic microscopy society
Annual international conference on Magnetic Resonance
Conference on Diagnostic Microscopy Basic Research & Oncology, located at the University Medical Center in Regensburg, Germany
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