JEOL - Electron Beam Lithography

Electron Beam Lithography

In the year 1967 JEOL started to develop and to manufacture electron beam lithography systems. The product line includes systems for masks and direct writing lithography and ranges from laboratory systems to production systems for masks.


In addition, JEOL offers modular systems based on scanning electron microscopes for less complex lithography applications, especially to be used in the field of nano technology research and development.

 

Models:

For additional product information, please select a model from the following list.

  • JEOL JBX-3050MV

    JEOL JBX-3050MV

    High-performance system for the mask exposure of structure sizes down to 32 nm. LaB6 cathode with shaped beam electron optics. Writing field 150 mm x 150 mm. Electron source: LaB6 emitter. Acceleration voltage: 50 kV...

  • JEOL JBX-9300FS

    JEOL JBX-9300FS

    Spot beam system for direct writing and mask production. Large writing fields for all voltages. Stage travel 230 mm x 230 mm, substrate sizes of up to 300 mm. Automatic single cartridge operation (two cartridges can be loaded) or automatic loading system for up to …

  • JEOL JBX-6300FS

    JEOL JBX-6300FS

    Spot beam system for very fine structures (direct writing and mask production). Ideal for research and development. Minimal tolerances for stitching and overlay. Stage travel 150 mm x 150 mm, substrate sizes of up to 200 mm. Single cartridge operation or …

  • JEOL JBX-5500FS

    JEOL JBX-5500FS

    Compact spot beam system for very fine structures. PC controlled, ideal for research and development. Easy to operate. Two different writing modes for high resolution and high speed …

 

Subject to technical changes; errors excepted. All brand names that appear in the text are registered trademarks of the manufacturers.

 

Exhibition Dates

  • Scandem

    12.06. - 15.06.2012 in Bergen, Norway

    63rd annual meeting of SCANDEM, the Nordic microscopy society

  • Euromar 2012

    01.07. - 05.07.2012 in Dublin, Ireland

    Annual international conference on Magnetic Resonance

  • Ultrapath XVI

    06.08. - 10.08.2012 in Regensburg, Germany

    Conference on Diagnostic Microscopy Basic Research & Oncology, located at the University Medical Center in Regensburg, Germany

All dates